Shao-Hui Hsu
Plasma is an efficient method for many semiconductor fabrication processes. In this lesson, the basic concepts, parameters, and applications of plasma are introduced in semiconductor manufacturing field. Ion implantation is a material engineering process that charges the chemical and physical properties of solid target by driving dopants into a solid target. The history, the brief introduction of equipment, the concerns of process integrations, the applications of ion implantation are highlighted in this lesson as well. By obtaining the knowledge of plasma and ion implantation, people who attend this lesson could understand the motivations and key points of semiconductor device manufacturing by using these processes.
PLASMA-1
PLASMA-2
Ion imp
Aout TSRI
The Taiwan Semiconductor Research Institute (TSRI) under the National Applied Research Laboratories (NARLabs) is a consolidation of the National Chip Implementation Center (CIC) and National Nano Device Laboratories (NDL). An integrated research environment for related fields of study in Taiwan is urgently required to enhance the overall cultivation of quality talents in response to the introduction of the 3-nm node; rapid development of new applications (e.g., artificial intelligence, quantum computers, next-gen magnetic random access memory, high-speed computers, and 5G network); and challenges posed by countries including European countries, the United States, Japan, and South Korea.